Methods and apparatus for wet cleaning electrode assemblies...

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

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C134S034000

Reexamination Certificate

active

07942973

ABSTRACT:
A method for cleaning an electrode assembly comprising a backing plate bonded to an electrode plate for a plasma processing assembly, the method including the steps of contacting the backing plate and electrode plate with a solvent; spraying the backing plate and electrode plate with water; ultrasonically cleaning the electrode assembly; enclosing the electrode assembly in a flushing fixture defined by a base plate having a plurality of liquid passages and a cover plate configured to cover the base plate, the cover plate including at least one liquid passage; and flushing the electrode assembly in the flushing fixture by introducing a flushing liquid under pressure through said at least one liquid passage in the cover plate.

REFERENCES:
patent: 6787111 (2004-09-01), Roach et al.
patent: 2003/0190870 (2003-10-01), Shih et al.
patent: 07-066180 (1995-03-01), None
patent: 18-179550 (2006-07-01), None
patent: WO 03/065433 (2003-08-01), None
International Search Report and Written Opinion dated Apr. 2, 2008 for International Application No. PCT/US2007/021628.
Chinese Office Action dated May 11, 2010 in corresponding Chinese Application.

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