Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2011-05-03
2011-05-03
Booth, Richard A. (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C257SE21561
Reexamination Certificate
active
07935585
ABSTRACT:
A method for fabricating a semiconductor device, comprising: forming a semiconductor film on a substrate; and recrystallizing the semiconductor film using as a heat source flame of a gas burner that uses hydrogen and oxygen gas mixture as a fuel.
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S. Higashi et al., “Crystallization of Si Thin Film Using Thermal Plasma Jet and Its Application to Thin-Film Transistor Fabrication”, AM-LCD '04 Technical Digest Papers, p. 179.
Sato Mitsuru
Utsunomiya Sumio
Booth Richard A.
Oliff & Berridg,e PLC
Seiko Epson Corporation
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