Method for manufacturing antenna and method for...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor

Reexamination Certificate

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C438S662000, C438S676000, C257SE21028, C257SE21347

Reexamination Certificate

active

07994030

ABSTRACT:
The present invention provides an antenna with low resistance and a semiconductor device having an antenna whose communication distance is improved. A fluid containing conductive particles is applied over an object. After curing the fluid containing the conductive particles, the fluid is irradiated with a laser to form an antenna. As a method for applying the fluid containing the conductive particles, screen printing, spin coating, dipping, or a droplet discharging method is used. Further, a solid laser having a wavelength of 1 nm or more and 380 nm or less is used as the laser.

REFERENCES:
patent: 6846696 (2005-01-01), Adachi et al.
patent: 7365805 (2008-04-01), Maekawa et al.
patent: 7421775 (2008-09-01), Kwak et al.
patent: 7518692 (2009-04-01), Yamazaki et al.
patent: 7651932 (2010-01-01), Aoki et al.
patent: 2006/0046512 (2006-03-01), Nakamura et al.
patent: 2008/0246036 (2008-10-01), Yamazaki et al.
patent: 2004-220591 (2004-08-01), None

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