Surface inspection method and surface inspection device

Optics: measuring and testing – Inspection of flaws or impurities

Reexamination Certificate

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C356S237600, C356S369000

Reexamination Certificate

active

07907268

ABSTRACT:
A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.

REFERENCES:
patent: 5739898 (1998-04-01), Ozawa et al.
patent: 7369224 (2008-05-01), Oomori et al.
patent: 2004/0063232 (2004-04-01), Komatsu et al.
patent: 2005/0280806 (2005-12-01), Oomori et al.
patent: 04-206813 (1992-07-01), None
patent: 07-049927 (1995-02-01), None
patent: 08-250395 (1996-09-01), None
patent: 2000-206050 (2000-07-01), None
patent: 2001-108637 (2001-04-01), None
patent: 2002-280388 (2002-09-01), None
patent: 3644041 (2005-02-01), None
patent: 3669101 (2005-04-01), None
patent: 2006-343102 (2006-12-01), None

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