Semiconductor device having a magnetization configuration of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S421000, C438S003000

Reexamination Certificate

active

07939869

ABSTRACT:
A semiconductor device includes: a first source region and a first drain region formed at a distance from each other in a semiconductor substrate; a first gate insulating film formed on the semiconductor substrate between the first source region and the first drain region; a first gate electrode formed on the first gate insulating film; a first source electrode formed above the first source region and including a ferromagnetic layer having an easy axis of magnetization in a first direction; a first drain electrode formed above the first drain region and including a ferromagnetic layer magnetized in a second direction at an angle larger than 0 degrees but not larger than 180 degrees with respect to the first direction; and a second drain electrode formed above the first drain region, being located at a distance from the first drain electrode, and including a ferromagnetic layer magnetized in a direction substantially antiparallel to the second direction.

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patent: 2006/0227466 (2006-10-01), Yagami
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U.S. Appl. No. 12/200,169, filed Aug. 28, 2008, Inokuchi, et al.
Masaaki Tanaka, et al., “MOS-Based Spin Devices for Reconfigurable Logic”, IEEE Transactions on Electron Devices, vol. 54, No. 5, May 2007, pp. 961-976.

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