Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive...
Reexamination Certificate
1998-06-08
2001-03-27
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
C430S945000, C427S553000, C427S554000, C427S555000
Reexamination Certificate
active
06207341
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a method for producing a chemically adsorbed film. More specifically, the present invention relates to a method for producing a chemically adsorbed film which may be provided as a monomolecular film on the surface of a polymer substrate and is useful in modifying the surface of the substrate.
2. Description of the Related Art
A conventional method for producing a chemically adsorbed film is disclosed, for example, in Japanese Patent Publication No. 5-16087. According to the method disclosed in the patent publication, a chemically adsorbed film is formed on the surface of a substrate by allowing hydrophilic groups such as hydroxyl groups on the surface of a substrate to react with a chlorosilane surfactant. In the case of using a substrate where a large number of hydrophilic groups such as hydroxyl groups do not exist on the surface of a substrate, the following method is known from Japanese Laid-Open Patent Publication No. 6-200074. For example, the surface of the substrate is oxidized so as to be hydrophilic; and then a chlorosilane surfactant is chemically adsorbed onto the surface by performing an oxygen plasma treatment, a corona treatment, a UV light irradiation using a low-pressure mercury lamp, an immersion of the substrate in a chromic acid mixture (a mixed solution of concentrated sulfuric acid and potassium bichromate), or the like.
According to these conventional methods, however, even when oxidization is performed, satisfactory effects cannot be obtained, and a sufficient amount of hydrophilic groups (e.g., hydroxyl groups) required for reacting with a chlorosilane surfactant cannot be produced on the surface of a substrate. As a result, a chemically adsorbed film cannot be formed on the surface of the substrate at all, and even if the film can be formed, a high-density chemically adsorbed film cannot be obtained because there are many pin holes in the resulting film. Therefore, neither a chemically adsorbed film having satisfactory properties, e.g., water repellency, oil repellency, anti-contaminating property, antistatic property and the like, nor a chemically adsorbed film having practical durability can be obtained.
In addition, according to the above-described methods, since a desired part of the surface of the substrate cannot be selectively oxidized, it is impossible to obtain a chemically adsorbed film on which desired fine patterns are formed.
Therefore, a method for producing a high-density chemically adsorbed film and a method for producing a chemically adsorbed film having desired fine patterns thereon are required to be developed.
SUMMARY OF THE INVENTION
According to the present invention, a method for producing a chemically adsorbed film is provided. The method includes the steps of: irradiating a surface of a polymer substrate with ultraviolet laser light so as to produce a hydrophilic group on the surface of the polymer substrate; and contacting a chemical adsorption solution containing a chlorosilane-based chemical adsorbent and a nonaqueous solvent and the polymer substrate on which the hydrophilic group is produced; and reacting the hydrophilic group of the polymer substrate with a chlorosilyl group of the chlorosilane-based chemical adsorbent for forming a covalent bond, thereby forming a chemically adsorbed film on the surface of the polymer substrate.
In one embodiment, the ultraviolet laser light is selectively irradiated onto a predetermined part of the surface of the polymer substrate.
In another embodiment, the polymer substrate is made of a material selected from the group consisting of: polyimide, polycarbonate, polysulfone, polyethyleneterephthalate, polyetheretherketone, polyarylate, polyethersulfone, and polyetherimide.
In still another embodiment, the ultraviolet laser light is excimer laser light.
In still another embodiment, the chlorosilane-based chemical adsorbent has a fluorocarbon group.
According to another aspect of the present invention, a method for producing a chemically adsorbed film is provided. The method includes the steps of: irradiating a surface of a polymer substrate with ultraviolet light including a wavelength of about 175 nm or less so as to produce a hydrophilic group on the surface of the polymer substrate; and contacting a chemical adsorption solution containing a chlorosilane-based chemical adsorbent and a nonaqueous solvent and the polymer substrate on which the hydrophilic group is produced; and reacting the hydrophilic group of the polymer- substrate with a chlorosilyl group of the chlorosilane-based chemical adsorbent for forming a covalent bond, thereby forming a chemically adsorbed film on the surface of the polymer substrate.
In one embodiment, the ultraviolet light including a wavelength of about 175 nm or less is selectively irradiated onto a predetermined part of the surface of the polymer substrate.
Thus, the invention described herein makes possible the advantages of (1) providing a method for producing a high-density chemically adsorbed film; (2) providing a method for producing a chemically adsorbed film having excellent properties such as water/oil repellencies, anti-contaminating property, and antistatic property; (3) providing a method for producing a chemically adsorbed film having excellent durability; and (4) providing a method for producing a chemically adsorbed film having desired fine patterns thereon.
These and other advantages of the present invention will become apparent to those skilled in the art upon reading and understanding the following detailed description with reference to the accompanying figures.
REFERENCES:
patent: 3535145 (1970-10-01), Gowdy et al.
patent: 3619246 (1971-11-01), Bragole
patent: 3849166 (1974-11-01), Omichi et al.
patent: 4568632 (1986-02-01), Blum et al.
patent: 4810601 (1989-03-01), Allen et al.
patent: 5139925 (1992-08-01), Hartney
patent: 5324543 (1994-06-01), Ogawa et al.
patent: 5372888 (1994-12-01), Ogawa et al.
patent: 5500250 (1996-03-01), Ogawa et al.
patent: 516087 (1993-03-01), None
patent: 6200074 (1994-07-01), None
Ikuta Shigeo
Ogawa Kazufumi
Soga Mamoru
Hamilton Cynthia
Matsushita Electric - Industrial Co., Ltd.
Renner Otto Boisselle & Sklar
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