Nonvolatile ferroelectric memory

Details Nonvolatile ferroelectric memory Nonvolatile ferroelectric memory

2000-08-31

2001-09-04

Phan, Trong (Department: 2818)

Static information storage and retrieval

Systems using particular element

Ferroelectric

C365S203000

Reexamination Certificate

active

06285576

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor device, and more particularly, to a nonvolatile ferroelectric memory.
2. Background of the Related Art
Generally, a nonvolatile ferroelectric memory, i.e., a ferroelectric random access memory (FRAM) has a data processing speed equal to a dynamic random access memory (DRAM) and retains data even in power off. For this reason, the nonvolatile ferroelectric memory has received much attention as a next generation memory device.
The FRAM and DRAM are memory devices with similar structures, but the FRAM includes a ferroelectric capacitor having a high residual polarization characteristic. The residual polarization characteristic permits data to be maintained even if an electric field is removed.
FIG. 1
shows hysteresis loop of a general ferroelectric. As shown in
FIG. 1
, even if polarization induced by the electric field has the electric field removed, data is maintained at a certain amount (i.e., d and a states) without being erased due to the presence of residual polarization (or spontaneous polarization). A nonvolatile ferroelectric memory cell is used as a memory device by corresponding the d and a states to 1 and 0, respectively.
A related art nonvolatile ferroelectric memory device will now be described.
FIG. 2
shows unit cell of a related art nonvolatile ferroelectric memory.
As shown in
FIG. 2
, the related art nonvolatile ferroelectric memory includes a bitline B/L formed in one direction, a wordline W/L formed to cross the bitline, a plate line P/L spaced apart from the wordline in the same direction as the wordline, a transistor T
1
with a gate connected with the wordline and a source connected with the bitline, and a ferroelectric capacitor FC
1
. A first terminal of the ferroelectric capacitor FC
1
is connected with a drain of the transistor T
1
and second terminal is connected with the plate line P/L.
The data input/output operation of the related art nonvolatile ferroelectric memory device will now be described.
FIG. 3
a
is a timing chart illustrating the operation of the write mode of the related art nonvolatile ferroelectric memory device, and
FIG. 3
b
is a timing chart illustrating the operation of read mode thereof.
During the write mode, an externally applied chip enable signal CSBpad is activated from high state to low state. At the same time, if a write enable signal WEBpad is applied from high state to low state, the write mode starts. Subsequently, if address decoding in the write mode starts, a pulse applied to a corresponding wordline is transited from low state to high state to select a cell.
A high signal in a certain period and a low signal in a certain period are sequentially applied to a corresponding plate line in a period where the wordline is maintained at high state. To write a logic value “1” or “0” in the selected cell, a high signal or low signal synchronized with the write enable signal WEBpad is applied to a corresponding bitline.
In other words, a high signal is applied to the bitline, and if the low signal is applied to the plate line in a period where the signal applied to the wordline is high, a logic value “1” is written in the ferroelectric capacitor. A low signal is applied to the bitline, and if the signal applied to the plate line is high, a logic value “0” is written in the ferroelectric capacitor.
The reading operation of data stored in a cell by the above operation of the write mode will now be described. If an externally applied chip enable signal CSBpad is activated from high state to low state, all of bitlines become equipotential to low voltage by an equalizer signal EQ before a corresponding wordline is selected.
Then, the respective bitline becomes inactive and an address is decoded. The low signal is transited to the high signal in the corresponding wordline according to the decoded address so that a corresponding cell is selected.
The high signal is applied to the plate line of the selected cell to destroy data corresponding to the logic value “1” stored in the ferroelectric memory. If the logic value “0” is stored in the ferroelectric memory, the corresponding data is not destroyed.
The destroyed data and the data that is not destroyed are output as different values by the ferroelectric hysteresis loop, so that a sensing amplifier senses the logic value “1” or “0”. In other words, if the data is destroyed, the “d” state is transited to an “f” state as shown in hysteresis loop of FIG.
1
. If the data is not destroyed, “a” state is transited to the “f” state. Thus, if the sensing amplifier is enabled after a set time has elapsed, the logic value “1” is output in case that the data is destroyed while the logic value “0” is output in case that the data is not destroyed.
As described above, after the sensing amplifier outputs data, to recover the data to the original data, the plate line becomes inactive from high state to low state at the state that the high signal is applied to the corresponding wordline.
FIG. 4
is a block diagram showing the related art nonvolatile ferroelectric memory device. As shown in
FIG. 4
, the related art nonvolatile ferroelectric memory device includes a main cell array
41
, a reference cell array
42
assigned on a lower part of the main cell array
41
, a wordline driver
43
formed at a side of the main cell array for applying a driving signal to the main cell array
41
and the reference cell array
42
, and a sense amplifier unit
44
formed at a lower part of the reference cell array
42
.
The wordline driver
43
applies the driving signal to a main wordline of the main cell array
41
and a reference wordline of the reference cell array
42
. The sense amplifier unit
44
includes a plurality of sense amplifiers that each amplifies signals of a corresponding bitline B/L and bit bar line BB/L.
The operation of the related art nonvolatile ferroelectric memory device will now be described with reference to FIG.
5
.
FIG. 5
is a partially detailed view of FIG.
4
. As shown in the drawing, the main cell array has a folded bitline structure in the same manner as DRAM.
Also, the reference cell array
42
has a folded bitline structure and includes a reference cell wordline and a reference cell plate line in pairs. At this time, reference cell wordline and the reference cell plate line pairs are defined as RWL_
1
and RPL_
1
, and RWL_
2
and RPL_
2
, respectively.
When the main cell wordline MWL_N-
1
and the main cell plate line MPL_N-
1
are activated, the reference cell wordline RWL_
1
and the reference cell plate line RPL_
1
are activated. Therefore, data in the main cell is loaded into the bitline B/L and data in the reference cell is loaded into the bit bar line BB/L.
When the main cell wordline MWL_N and the main cell plate line MPL_N are activated, the reference cell wordline RWL_
2
and the reference cell plate line RPL_
2
are activated. Therefore, data in the main cell is loaded into the bit bar line BB/L and data in the reference cell is loaded into the bitline B/L.
The reference voltage REF by the reference cell exists between the bitline levels B_H(high) and B_L(low) by the main cell. To generate the reference voltage REF between the bitline levels B_H and B_L, the logic value “1” or “0” may be stored in a capacitor of the reference cell. When the logic value “1” is stored in the capacitor of the reference cell, the size of the capacitor of the reference cell is smaller than that of the capacitor of the main cell. When the logic value “0” is stored in the capacitor of the reference cell, the size of the capacitor of the reference cell is greater than that of the capacitor of the main cell.
As described above, the related art nonvolatile ferroelectric memory has various disadvantages. If a capacitor size of the reference cell is smaller, the excessive access to the capacitor of the reference cell compared to the main cell causes fatigue or breakdown of the reference cell before the main cell, which results in an unstable reference level. The unstable reference

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