Plasma confinement for an inductively coupled plasma reactor

Details Plasma confinement for an inductively coupled plasma reactor Plasma confinement for an inductively coupled plasma reactor

1997-02-06

1998-10-20

Breneman, R. Bruce

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

118723IR, 118723MA, 156345, 216 70, 134 11, H01L 21461, B05C 1102, C13F 162, B08B 600

Patent

active

058246070

ABSTRACT:
A plasma reactor chamber uses an antenna driven by RF energy (LF, MF, or VHF) which is inductively coupled inside the reactor dome to provide a plasma source. The antenna generates a high density, low energy plasma inside the chamber. The chamber includes a plurality of magnets for generating magnetic fields. Ion flux is concentrated in certain areas of the chamber and is diverted from other areas of the chamber by using these magnetic fields. Various magnetic and voltage processing enhancement techniques are disclosed, along with etch processes, deposition processes and combined etch/deposition processes. The disclosed invention provides a means of cleaning the deposition residues from the reactor walls while minimizing damage to the wafer pedestal.

REFERENCES:
patent: 4438368 (1984-03-01), Abe et al.
patent: 4740268 (1988-04-01), Buckhman
patent: 5181986 (1993-01-01), Ohiwa
patent: 5198725 (1993-03-01), Chen et al.
patent: 5223457 (1993-06-01), Mintz et al.
patent: 5266146 (1993-11-01), Ohno et al.
patent: 5389154 (1995-02-01), Hiroshi et al.
patent: 5514246 (1996-05-01), Blalock
patent: 5556501 (1996-09-01), Collins et al.
patent: 5587205 (1996-12-01), Saito et al.

Affiliated with

Also associated with

Rating

Plasma confinement for an inductively coupled plasma reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma confinement for an inductively coupled plasma reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma confinement for an inductively coupled plasma reactor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-243987