Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-01-19
1989-09-05
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419223, 204298, C23C 1434
Patent
active
048635766
ABSTRACT:
Apparatus for coating optical fibers with thin hermetic films based on cylindrical magnetron reactive sputtering and charged particle assisted deposition is disclosed. The thin film coated on the fiber is composed of material sputtered from a cylindrical cathode as well as material from reactive feedstock gases. The cylindrical cathode insures uniform deposited film thickness on a cylindrical fiber at high deposition rates. A cylindrical inner extraction grid acts to create ion or electron bombardment of the outer surface of the fiber as it is coated. As a consequence of the enclosed cylindrical geometry, the high magnetron sputtering rate, and the in-situ charged particle bombardment, hermetic coatings of high quality may be placed on fibers pulled through the deposition apparatus at rates of 1-20 meters/second. An external laser beam directed along the longitudinal axis of the cylindrical magnetron may be employed to improve the coating process.
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Collins George J.
McNeil John R.
Hein William E.
Nguyen Nam X.
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