Heterojunction bipolar transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – With lattice constant mismatch

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257198, 257592, H01L 29161, H01L 2972

Patent

active

051775832

ABSTRACT:
In a first heterojunction bipolar transistor (HBT) of the present invention, base layers and collector layers are respectively divided into a plurality of layers and one of the base layers provided closer to the collector layer reiogn is set lower in impurity concentration than the other thereof provided closer to an emitter layer, thus solving a problem that thermal histories during epitaxial growth or during processes cause a set impurity distribution to be destroyed due to diffusion and thus a heterojunction is shifted from a p-n junction. Since minority carriers in the base can smoothly flow toward the collector, there can be realized an excellent HBT having a very high current gain and a very high cut-off frequency. In a second HBT of the invention, a base region comprises a first base layer of a low concentration having the same energy band gap as an emitter region and to be changed to a complete depletion layer in a thermally balanced state and a graded second base layer of a high concentration, and the first and second base layers form a heterojunction, thereby realizing an excellent HBT having a high speed performance which can exhibit a sufficient grading effect while preventing deterioration of an emitter-base voltage withstanding characteristic.

REFERENCES:
patent: 4593305 (1986-06-01), Kurata et al.
H. Kroemer, "Heterostructure Bipolar Transistors and Integrated Circuits", Proc. IEEE, vol. 70, No. 1, Jan. 1982, pp. 13-25.
Aicha Elshabini-Riad et al., "Investigation of Injection Mechanisms for InGaAs/InP Double Heterostructure Bipolar Transistors", Solid-State Electronics, vol. 32, No. 10, 1989, pp. 853-860.
O. Nakajima et al., "Emitter-Base Junction Size Effect on Current Gain H.sub.fe of AlGaAs/GaAs Heterojunction Bipolar Transistors", Japanese Journal of Applied Physics, vol. 24, No. 8, Aug. 1985, pp. L596-L598.
C. S. Kyono et al., "Very High Current Gain InGaAs/InP Heterojunction Bipolar Transistors Grown by Metalorganic Chemical Vapour Deposition", Electronics Letters, vol. 27, No. 1, Jan. 3, 1991, pp. 40-41.
H. Fukano et al., "Improving the Characteristics of InAlAs/InGaAs Heterojunction Bipolar Transistors by Employing Thin Base and Collector Layers", Electronics Letters, vol. 26, No. 15, Jul. 19, 1990, pp. 1101-1102.
P. Narozny et al., "Si/SiGe Heterojunction Bipolar Transistor With Graded GAP SiGe Base Made by Molecular Beam Epitaxy", IEDM Technical Digest, 1988, pp. 562-565.
H.-U. Schreiber et al., "Si/SiGe Heterojunction Bipolar Transistor With Base Doping Highly Exceeding Emitter Doping Concentration", Electronics Letters, vol. 25, No. 3, Feb. 2, 1989, pp. 185-186.
C. A. King et al., "Si/Si.sub.1-X Ge.sub.X Heterojunction Bipolar Transistors Produced by Limited Reaction Processing", IEEE Electron Device Letters, vol. 10, No. 2, Feb. 1989, pp. 52-54.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Heterojunction bipolar transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heterojunction bipolar transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heterojunction bipolar transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2394518

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.