Process for making micromechanical structures

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

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438735, H01L 21302

Patent

active

060081384

ABSTRACT:
A process for structuring a movable element out of a membrane region. A sacrificial layer and a sealing layer are applied to the underside of the membrane region. Following removal of the sacrificial layer, sealing layer forms a limit stop and a seal for the movement of the movable element.

REFERENCES:
patent: 5270259 (1993-12-01), Ito et al.
patent: 5374792 (1994-12-01), Ghezzo et al.
patent: 5472539 (1995-12-01), Saia et al.
patent: 5698112 (1997-12-01), Naeher et al.

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