Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent
1997-03-07
1999-12-28
Powell, William
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
438735, H01L 21302
Patent
active
060081384
ABSTRACT:
A process for structuring a movable element out of a membrane region. A sacrificial layer and a sealing layer are applied to the underside of the membrane region. Following removal of the sacrificial layer, sealing layer forms a limit stop and a seal for the movement of the movable element.
REFERENCES:
patent: 5270259 (1993-12-01), Ito et al.
patent: 5374792 (1994-12-01), Ghezzo et al.
patent: 5472539 (1995-12-01), Saia et al.
patent: 5698112 (1997-12-01), Naeher et al.
Laermer Franz
Schilp Andrea
Okoro Bernadine
Powell William
Robert & Bosch GmbH
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