4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Andrea Schilp

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Anisotropic, fluorine-based plasma etching method for silicon

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Device and method for determining the lateral undercut of a...

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Electrical characteristic sensed
Reexamination Certificate

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Device and method for etching a substrate by using an...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Device and method for etching a substrate by using an...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With plasma generation means remote from processing chamber
Reexamination Certificate

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Device and method for etching a substrate using an...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Profile ID: LFUS-PAI-P-360142

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