Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1991-08-27
1994-10-18
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156656, 156664, B05D 500
Patent
active
053565142
ABSTRACT:
Disclosed is an etching apparatus primarily comprising a reactive etching chamber, a post-treatment chamber connected thereto and/or a purified water treatment chamber connected to the post-treatment chamber and also a process for etching a film of Fe-containing material forming the surface of a sample, which comprises subjecting the sample to reactive etching in an atmosphere of chlorine-containing gas while the sample is heated to not lower than 250.degree. C. in vacuo, wherein the sample may be subjected to an ion shower of a gaseous mixture comprising the chlorine-containing gas and at least one inert gas while the sample is heated to not lower than 250.degree. C. and not higher than the melting point of the sample; subjecting the sample to post-treatment so as to allow the etching residues left on the sample surface to react fully with the chlorine-containing gas; and then subjecting the sample to a purified water treatment by immersing the sample in a purified water so as to dissolve and remove the etching products formed during said post-treatment step.
REFERENCES:
patent: 4375390 (1983-03-01), Anderson et al.
patent: 4439294 (1984-03-01), Brill et al.
patent: 4693777 (1987-09-01), Hazano et al.
patent: 5091050 (1992-02-01), Fujimo et al.
Dang Thi
NEC Corporation
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