Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1996-03-15
1997-10-07
Tran, Minh-Loan
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257298, 257300, 257301, H01L 27108
Patent
active
056751605
ABSTRACT:
In a DRAM memory cell comprising one capacitor having a capacitor electrode and an opposing electrode, and one insulated gate field effect transistor formed in a semiconductor substrate and having a pair of source/drain regions, one of which is connected to the capacitor electrode of the capacitor. A double gate thin film transistor having the same channel conductivity type as that of the insulated gate field effect transistor, is formed above the insulated gate field effect transistor. A first gate electrode of the thin film transistor is constituted of a gate electrode of the insulated gate field effect transistor, and a second gate electrode of the thin film transistor is constituted of the capacitor electrode of the capacitor. A source region of the thin film transistor and the other of the pair of source/drain regions of the insulated gate field effect transistor is connected to a bit line, and a drain region of the thin film transistor is connected to a power supply line.
REFERENCES:
patent: 4920391 (1990-04-01), Uchida
patent: 5463234 (1995-10-01), Toriumi et al.
NEC Corporation
Tran Minh-Loan
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