Processing chamber with optical window cleaned using process gas

Details Processing chamber with optical window cleaned using process gas Processing chamber with optical window cleaned using process gas

1999-03-31

2000-04-18

Evans, F. L.

Optics: measuring and testing

With plural diverse test or art

359509, 216 60, 438 16, 356381, G01B 1100, G02B 700

Patent

active

060521767

ABSTRACT:
An apparatus is provided including a semiconductor processing chamber enclosed by a plurality of walls. Also included is a source of process gas that is required for processing a wafer within the processing chamber. Mounted on one of the walls of the processing chamber is a window. An inlet is positioned adjacent to the window and remains in communication with the processing chamber. The inlet is further coupled to the source of process gas to channel the process gas into the processing chamber for both preventing the deposition of byproducts on the window and further processing the wafer within the processing chamber. In another embodiment, a source of light, an analysis mechanism, and an optical transmission medium are provided. Such optical transmission medium is coupled between the source of light and the analysis mechanism and is further aligned with the window for directing light into the processing chamber and analyzing the wafer within the processing chamber. The window is configured to reflect the light received from the optical transmission medium at an angle so as to not interfere with light reflected from the wafer within the processing chamber.

REFERENCES:
patent: 4469713 (1984-09-01), Schwiecker et al.
patent: 4582431 (1986-04-01), Cole
patent: 4816294 (1989-03-01), Tsuo et al.
patent: 5807761 (1998-09-01), Coronel et al.

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