Surface-plasma-wave coating technique for dielectric filaments

Details Surface-plasma-wave coating technique for dielectric filaments Surface-plasma-wave coating technique for dielectric filaments

1995-04-24

1997-01-21

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118723MW, 4271632, 4272555, 427585, B05D 104

Patent

active

055957935

ABSTRACT:
A method and device is described to generate plasmas on the surface of dielectric filaments and--by a plasma chemical vapor deposition (CVD) mechanism--deposit dielectric films on the filaments as they move through the plasma zone. The plasma generated by plasma surface waves are located only in the vicinity of the filament thus reducing precursor gas consumption, deposition on chamber walls, power requirements. The method is particular suitable for manufacturing dielectric coated optical fibers.

REFERENCES:
patent: 5000541 (1991-03-01), DiMarcello et al.
patent: 5178743 (1993-01-01), Kumar

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