Automated washing method

Details Automated washing method Automated washing method

1993-03-05

2000-01-25

Vincent, Sean

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 10, 134 30, 134 37, 216 48, 430256, B08B 300

Patent

active

060173971

ABSTRACT:
A system and a method for washing objects, such as cassettes and carriers used to hold and transport silicon wafers during manufacture of semiconductor chips. The method employs the steps of exposing to ultraviolet radiation the objects in a process chamber, spraying of developer fluid onto the objects, rinsing the objects, spraying of surfactant solution on the objects, rinsing the objects and drying the objects using heated, ionized ULPA filtered air. Apparatus for accomplishing the above is disclosed.

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Solymar, L. et al, "9.20 Microelectronic circuits," Lectures on the Electrical Properties of Materials, 4.sup.th ed, Univ. of Oxford, 1990, (no month available).

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