Plasma film forming apparatus that prevents substantial irradiat

Details Plasma film forming apparatus that prevents substantial irradiat Plasma film forming apparatus that prevents substantial irradiat

1996-08-02

2000-01-25

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723E, 118723ER, 118723R, C23C 1600

Patent

active

060173963

ABSTRACT:
A film formation device for forming a film on a substrate according to the present invention includes: a plurality of vacuum chambers, each of the plurality of vacuum chambers including a gas introduction section for introducing a reactive gas, a plasma generation section for generating a plasma, and a support member for supporting the substrate. The plasma generation section in at least one of the plurality of vacuum chambers is disposed at a predetermined position for preventing the substrate from sustaining substantial irradiation damage by the generated plasma.

REFERENCES:
patent: 4274936 (1981-06-01), Love
patent: 4461783 (1984-07-01), Yamazaki
patent: 4615298 (1986-10-01), Yamazaki
patent: 4738761 (1988-04-01), Bobbio et al.
patent: 4828369 (1989-05-01), Hotomi
patent: 5114529 (1992-05-01), Masuyama et al.
patent: 5147520 (1992-09-01), Bobbio
patent: 5174881 (1992-12-01), Iwasaki et al.
patent: 5180435 (1993-01-01), Markunas et al.
patent: 5288329 (1994-02-01), Nakamura et al.
patent: 5292393 (1994-03-01), Maydan et al.
patent: 5556501 (1996-09-01), Collins et al.
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5679167 (1997-10-01), Muehlberger
patent: 5707486 (1998-01-01), Collins
patent: 5707692 (1998-01-01), Suzuki
patent: 5720821 (1998-02-01), Halpern
patent: 5780313 (1998-07-01), Yamazaki
patent: 5795399 (1998-08-01), Hasegawa et al.

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