Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-04-15
1993-08-31
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 522112, G03F 7038, G03F 7004
Patent
active
052408116
ABSTRACT:
Photoresist formulations and coatings are provided which contain a polymer having pendant tetrazole-5-thione groups which upon exposure to ultraviolet light decompose to carbodiimides and thereby providing means for crosslinking the base polymer to provide high resolution and thermal stability.
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patent: 4104070 (1978-08-01), Moritz et al.
patent: 4487964 (1984-12-01), Watson, Jr. et al.
patent: 4629679 (1986-12-01), Uchida et al.
patent: 4820863 (1989-04-01), Taylor
Bassett David R.
Taylor James W.
Hamilton Cynthia
OCG Microelectronic Materials Inc.
Simons William A.
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