Photogenerated polycarbodiimides from poly(tetrazole-5-thiones)

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430910, 522112, G03F 7038, G03F 7004

Patent

active

052408116

ABSTRACT:
Photoresist formulations and coatings are provided which contain a polymer having pendant tetrazole-5-thione groups which upon exposure to ultraviolet light decompose to carbodiimides and thereby providing means for crosslinking the base polymer to provide high resolution and thermal stability.

REFERENCES:
patent: 4104070 (1978-08-01), Moritz et al.
patent: 4487964 (1984-12-01), Watson, Jr. et al.
patent: 4629679 (1986-12-01), Uchida et al.
patent: 4820863 (1989-04-01), Taylor

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