Method for conditioning halogenated polymeric materials and stru

Details Method for conditioning halogenated polymeric materials and stru Method for conditioning halogenated polymeric materials and stru

1996-09-12

1998-03-24

Powell, William

Etching a substrate: processes

Nongaseous phase etching of substrate

Irradiating, ion implanting, alloying, diffusing, or...

216 13, 216 18, B44C 122

Patent

active

057308900

ABSTRACT:
A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.

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