Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-05-04
1992-03-31
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430271, 522173, G03C 1725, C08F 246
Patent
active
051007681
ABSTRACT:
A photosensitive composition contains an alkali-soluble polymer having a phenol skeleton in its structure and a heterocyclic compound represented by formula (I-1) or (I-2), formula (II-1) or (II-2), any of formulas (III-1) to (III-8), any of formulas (IV-1) to (IV-12), or any of formulas (V-1) to (V-4) described in the claims and specification. A photosensitive composition containing a heterocyclic compound represented by formula (I-1) or (I-2), any of formulas (III-1) to (III-8), any of formulas (IV-1) to (IV-12), or any of formulas (V-1) to (V-4) can be suitably used as a negative resist. A photosensitive composition containing a heterocyclic compound represented by formula (II-1) or (II-2) can be suitably used as a positive resist. A photosensitive composition containing an alkali-soluble polymer having a phenol skeleton in its structure and a polymer having a nitrogen-containing heterocyclic compound as a polymeric unit is also included in this invention. The latter photosensitive composition can further contain a heterocyclic compound represented by any of formulas (VI-1) to (VI-15) described in the claims and specification.
REFERENCES:
patent: 4251619 (1981-02-01), Kurita
patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4910119 (1990-03-01), Schneller et al.
patent: 4943516 (1990-07-01), Kamayachi et al.
Chemical Reviews, vol. 70, No. 2, Apr. 1970 "The Photochemical Reactions of Azoxy Compounds, Nitrones, and Aromatic Amine N-Oxides" Gavin G. Spence, et al.
Hayase Rumiko
Kobayashi Yoshihito
Niki Hirokazu
Onishi Yasunobu
Chapman Mark A.
Kabushiki Kaisha Toshiba
McCamish Marion E.
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