Positive type electrodeposition photoresist compositions

Details Positive type electrodeposition photoresist compositions Positive type electrodeposition photoresist compositions

1994-04-26

1996-06-18

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, 430919, 430921, G03C 173

Patent

active

055276563

ABSTRACT:
A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxyphenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.

REFERENCES:
Moon, Seongyun-Naitoh, Kazuhiko; and Yamaoka, Tsuguo. "Novel Dual-Mode Photoresist Based on Cationic Polymerization and Acidolysis" Chem. Mater. 1993, 1315-1320.

Affiliated with

Also associated with

Rating

Positive type electrodeposition photoresist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive type electrodeposition photoresist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type electrodeposition photoresist compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-221972