Front end vacuum processing environment

Details Front end vacuum processing environment Front end vacuum processing environment

1997-09-30

2000-06-06

Brahan, Thomas J.

Material or article handling

Apparatus for moving material between zones having different...

For carrying standarized mechanical interface type

414937, 414939, B65G 5102

Patent

active

060710551

ABSTRACT:
The present invention provides a wafer process system that incorporates a multiple wafer processing system, such as a tandem wafer processing system, and a front end staging apparatus. The front end staging apparatus includes a first transfer chamber in communication with a pair of loadlocks for introducing wafers into the system. A robot within the first transfer chamber moves individual wafers between the loadlocks, optional single wafer process chambers radially disposed about and in communication with the first transfer chamber, and a pair of intermediate staging chambers. The intermediate staging chambers communicate with both the first transfer chamber and a second transfer chamber of the tandem process system. A robot within the second transfer chamber moves the wafers, in tandem, between the intermediate staging chambers and tandem process chambers disposed about the periphery and communicating with the second transfer chamber.

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