Substrate treatment apparatus

Details Substrate treatment apparatus Substrate treatment apparatus

1998-07-13

2000-09-05

Edwards, Laura

Coating apparatus

Control means responsive to a randomly occurring sensed...

118667, 118688, 118695, 118696, 118708, 118712, 118641, 118 52, 118 56, 118 58, 118 64, 118 66, 118 69, 118319, 118320, 118500, 414935, 414937, 414939, 414217, 41422213, 414416, B05C 1302

Patent

active

061136948

ABSTRACT:
Apparatus for coating a surface of a semiconductor wafer includes at least one treatment module, a handling device that may access each of the treatment modules, and a host controller connected to the handling device and to each of the treatment modules. The treatment modules may include a coating assembly for coating the semiconductor wafer surface and may also include at least one thermal conditioning module. The host controller may control the handling device to move a semiconductor wafer relative to the treatment modules. The treatment modules may be disposed within opposing assemblies and may be removed from the assemblies without disabling the treatment modules remaining within the opposing assemblies.

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