Pattern forming method utilizing material with photoresist film

Details Pattern forming method utilizing material with photoresist film Pattern forming method utilizing material with photoresist film

1991-10-16

1993-02-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430142, 430158, 430160, 430163, 430311, 430325, 430326, 430329, 430333, 430334, 430339, G03F 730, G03F 7021

Patent

active

051889242

ABSTRACT:
A pattern forming method, comprising the steps of providing a resist film on a substrate; providing a photosensitive film containing a photosensitive diazonium salt on the resist film; and then subjecting the resultant composite to pattern exposure by use of a light to which both of the resist film and the photosensitive diazonium salt are sensitive, can employ a composition for pattern formation which comprises a photosensitive diazonium salt, a resin binder and a solvent. By this method, a minute pattern of 1 .mu.m or less can be formed, utilizing effectively the UV-ray exposure technique of the prior art, with good dimensional precision and stability.

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