Microwave plasma generating apparatus and process for the prepar

Details Microwave plasma generating apparatus and process for the prepar Microwave plasma generating apparatus and process for the prepar

1990-09-24

1993-02-23

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427249, 427575, 427577, 118723, 423466, 156DIG68, C23C 1648, C23C 1650

Patent

active

051888629

ABSTRACT:
A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means for radiating a plurality of microwaves having different directions of electric fields from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate to be formed thereon with the diamond thin film, the substrate being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.

REFERENCES:
patent: 3609448 (1971-09-01), Williams
patent: 4909184 (1990-03-01), Fujiyama
patent: 4989542 (1991-02-01), Kamo

Affiliated with

Also associated with

Rating

Microwave plasma generating apparatus and process for the prepar does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microwave plasma generating apparatus and process for the prepar, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave plasma generating apparatus and process for the prepar will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2203355