Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1991-09-03
1993-02-23
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156657, 156345, 437241, B44C 122, C03C 1500, C03C 2506
Patent
active
051887010
ABSTRACT:
A method of fabricating a semiconductor device (8), including the step of etching a layer of silicon nitride (12) formed on the semiconductor device in a hot phosphoric acid solution (1). The etching step comprises the steps of preparing a means (4) for supplying a low concentration phosphoric acid solution having a predetermined concentration, detecting (3) a temperature of the hot phosphoric acid solution in the etching tank (2), starting a supply of the low concentration phosphoric acid solution to the etching tank when a predetermined time has elapsed (t) after the detected temperature of the hot phosphoric acid solution in the etching tank becomes higher than a first predetermined temperatures (T.sub.1), and stopping the supply of the low concentration phosphoric acid solution when the detected temperature of the hot phosphoric acid solution becomes lower then a second predetermined temperature (T.sub.2) which is lower than the first predetermined temperature.
REFERENCES:
patent: 4710261 (1987-12-01), Dennis
patent: 4980017 (1990-12-01), Kaji et al.
"The Etching of Silicon Nitride in Phosphoric Acid with Silicon Dioxide as a Mask", Journal of Electrochemical Society-Solid State Science, vol. 114, No. 8, Aug. 1967, Manchester, New Hampshire, pp. 869-872.
"Process for Maintainign H.sub.3 PO.sub.4 Concentration", IBM Technical Disclosure Bulletin, vol. 16, No. 11, Apr. 1974, New York US, pp. 3540-3541.
Patent Abstracts of Japan, vol. 13, No. 328 (C-612) 24 Jul. 1989.
Patent Abstracts of Japan, vol. 6, No. 180 (C-125) 14 Sep. 1982.
Patent Abstracts of Japan, vol. 14, No. 518 (E-1001) 14 Nov. 1990.
Fujitsu Limited
Powell William A.
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