Coating processes – With post-treatment of coating or coating material – Heating or drying
Patent
1996-05-08
1998-06-09
Lusignan, Michael
Coating processes
With post-treatment of coating or coating material
Heating or drying
427578, 427404, 4274192, 438530, 438697, B05D 302, B05D 136, H05H 124
Patent
active
057630100
ABSTRACT:
A method of stabilizing a halogen-doped silicon oxide film to reduce halogen atoms migrating from said film during subsequent processing steps. A halogen-doped film is deposited over a substrate and then subjected to a degassing step in which the film is briefly heated to a temperature of between about 300.degree. and 550.degree. C. before deposition of a diffusion barrier layer. It is believed that such a heat treatment step removes loosely bonded halogen atoms from the halogen-doped film and thus the treatment is referred to as a degassing step. In a preferred version of this embodiment, the halogen-doped silicon oxide film is an FSG film that is subjected to a degassing treatment for between about 35 and 50 seconds.
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Cohen Barney M.
Guo Ted
Verma Amrita
Applied Materials Inc.
Chen Bret
Lusignan Michael
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