Method of etching films of silicon nitride and silicon dioxide

Details Method of etching films of silicon nitride and silicon dioxide Method of etching films of silicon nitride and silicon dioxide

1973-03-29

1976-09-07

Van Horn, Charles E.

Adhesive bonding and miscellaneous chemical manufacture

Methods

Surface bonding and/or assembly therefor

156 11, 156 17, 252 793, 252 794, H01L 21302, H01L 21316

Patent

active

039792412

ABSTRACT:
An etching liquid comprises ammonium fluoride or alkali fluoride dissolved in a polyvalent or higher alcohol.

REFERENCES:
patent: 3434896 (1969-03-01), Chance et al.
patent: 3518135 (1970-06-01), Cerniglia et al.
patent: 3607480 (1971-09-01), Harrap et al.
patent: 3709749 (1973-01-01), Sato et al.

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