Fine pattern forming method

Details Fine pattern forming method Fine pattern forming method

1991-02-12

1993-02-16

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, 1566611, 156668, 430296, 430313, 430325, 430394, G03C 500

Patent

active

051867885

ABSTRACT:
Disclosed is a fine pattern forming method which is capable of forming a high positive-to-negative reversal pattern high in dry-etch resistance, at high density, by irradiating an entire surface of a resist with ion shower at low doses before or after electron beam or focus ion beam exposure, and then developing it.

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