Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-01-06
1990-05-22
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, 20429803, 20429811, 2042982, 20429823, C23C 1454
Patent
active
049275135
ABSTRACT:
A method and apparatus for fabricating magneto-optical, storable, and/or deletable data carriers. One or more layers, each comprising two or more different chemical materials, are applied on a substrate (4) by means of a magnetron sputtering system (1). The fractional composition of each layer is controlled by changing the strength of the magnetic field produced by the magnetron system (1). By means of a suitable measuring device (51, 58) the compensation temperature of a particular layer is measured and compared with a desired value. If the measured compensation temperature differs from the desired value, the desired value can be attained by adjusting the cathode voltage U.sub.K of the magnetron system. A controller (63) is provided for controlling the cathode voltage and adjusting the distance between the magnetron system's target (6) and magnets (8, 9, 10).
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Hong, M. et al, "DC Magnetron- and Diode-Sputtered Polycrystalline Fe and Amorphous Tb(FeCo) Films: Morphology and Magnetic Properties", J. Appl. Phys., vol. 59, No. 2, 1986, pp. 551-556.
Kryder, M. H., "Summary Abstract: Magneto-Optic Recording Materials", J. Vac. Sci. Technol. A, vol. 4, No. 3, 1986, pp. 558-559.
Severin, H. G., "Sputtern, Die Erzeugung dunner Schichten", Physik in Unserer Zeit, 17, 1986, pp. 71-79.
Shieh, H. P. D., Dissertation, "Magneto-Optical Recording Media Fabrication, Characterization and Optimization", Carnegie-Mellon University, Pittsburgh, Pa., 1987, pp. 17-20.
Schultheiss Eberhard
Wirz Peter
Leybold Aktiengesellschaft
Weisstuch Aaron
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