Wafer pedestal with a purge ring

Coating apparatus – Gas or vapor deposition

Patent

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Details

118728, 156345, C23C 1600, H04H 100

Patent

active

061592994

ABSTRACT:
A wafer pedestal with a purge ring that circumscribes a peripheral edge of the wafer pedestal. The purge ring contains plurality of passages that are located proximate the peripheral edge of said wafer pedestal such that purge gas is directed towards the peripheral edge. Additionally, the purge ring cooperates with an edge ring assembly that circumscribes the purge ring. The purge ring and the edge ring assembly allow a dual-purge flow pattern to be established, which significantly reduces the accumulation of undesirable deposits upon the wafer pedestal.

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