Sulfonium salt and chemically amplified positive resist composit

Details Sulfonium salt and chemically amplified positive resist composit Sulfonium salt and chemically amplified positive resist composit

1996-12-10

1997-11-25

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03F 7004

Patent

active

056911122

ABSTRACT:
Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.

REFERENCES:
Chemical Abstract 123:325759.
Chemical Abstract 123:301551.
Chemical Registry, 157089-24-2.
Chemical Abstract of JP 6, 236, 036, vol. 122, No. 10, Mar. 6, 1995.

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