Photopolymerizable composition containing ethylenically unsatura

Details Photopolymerizable composition containing ethylenically unsatura Photopolymerizable composition containing ethylenically unsatura

1979-02-27

1980-10-14

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415919, 430278, 430281, 430284, 430286, 430288, 430306, 528 45, 528 75, 528 76, G03C 168, G03C 194

Patent

active

042282322

ABSTRACT:
A photopolymerizable composition is disclosed which comprises 10 to 60% by weight of an ethylenically unsaturated, carboxylic acid containing oligomer,

REFERENCES:
patent: 3840369 (1974-10-01), Carlick et al.
patent: 3907574 (1975-09-01), Yonezawa et al.
patent: 4057431 (1977-11-01), Finelli et al.
patent: 4065627 (1977-12-01), Harrison
patent: 4144073 (1979-03-01), Bronster et al.
patent: 4153778 (1979-05-01), Park et al.

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