Presensitized plates for lithography not requiring dampening wit

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430303, G03C 176, G03F 700

Patent

active

052664430

ABSTRACT:
A dry PS plate having a substrate provided thereon with a photopolymerizable light-sensitive layer and a silicone rubber layer in that order. The silicone rubber layer comprises a product obtained by crosslinking through addition reaction the following components:

REFERENCES:
patent: 4775607 (1988-10-01), Schlosser
patent: 4874686 (1989-10-01), Urabe et al.
patent: 4937169 (1990-06-01), Schlosser
patent: 5126228 (1992-06-01), Highashi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Presensitized plates for lithography not requiring dampening wit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Presensitized plates for lithography not requiring dampening wit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Presensitized plates for lithography not requiring dampening wit will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2094786

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.