Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-07-08
1993-11-30
Martin, Roland
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430303, G03C 176, G03F 700
Patent
active
052664430
ABSTRACT:
A dry PS plate having a substrate provided thereon with a photopolymerizable light-sensitive layer and a silicone rubber layer in that order. The silicone rubber layer comprises a product obtained by crosslinking through addition reaction the following components:
REFERENCES:
patent: 4775607 (1988-10-01), Schlosser
patent: 4874686 (1989-10-01), Urabe et al.
patent: 4937169 (1990-06-01), Schlosser
patent: 5126228 (1992-06-01), Highashi et al.
Higashi Tatsuji
Ohba Toshio
Fuji Photo Film Co. , Ltd.
Martin Roland
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Presensitized plates for lithography not requiring dampening wit does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Presensitized plates for lithography not requiring dampening wit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Presensitized plates for lithography not requiring dampening wit will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2094786