MOS transistor with large gate width

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257374, 257397, 257401, 257404, H01L 2906

Patent

active

057172390

ABSTRACT:
In a MOS transistor device, the gate width is effectively enlarged without increasing the occupied area of the transistor by forming a plurality of rectangular grooves in the direction perpendicular to the gate width, and filling in these rectangular grooves with a gate electrode. Since these grooves are formed by anisotropic etching, there is no risk of contaminating the wafer.

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