Processing of radiation sensitive plates

Details Processing of radiation sensitive plates Processing of radiation sensitive plates

1981-02-04

1982-09-21

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

25217421, 25217422, G03F 702, G11D 1700

Patent

active

043507565

ABSTRACT:
A developer for processing image-wise exposed negative-working radiation sensitive plates based on organic solvent soluble diazo resins or certain photocrosslinkable resins or photopolymerizable olefinically unsaturated compounds includes a surfactant and a salt of an aliphatic carboxylic acid containing up to nine carbon atoms. The developer is substantially aqueous and has a reduced tendency to foam formation. It is useful in the photomechanical production of lithographic printing plates.

REFERENCES:
patent: 3208949 (1965-09-01), Rosnati
patent: 3547632 (1970-12-01), Nadeau
patent: 3629122 (1971-12-01), Jakobi
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3745028 (1973-07-01), Rauner
patent: 3791828 (1974-02-01), Moore
patent: 4055515 (1977-10-01), Kirch
patent: 4147545 (1979-04-01), Rowe et al.
patent: 4268613 (1981-05-01), Okishi
patent: 4287082 (1981-09-01), Tolfo et al.

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