Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-05-12
1998-02-10
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419225, 20419229, C23C 1434
Patent
active
057165017
ABSTRACT:
A method of making electroluminescence emitting films each containing sulfide such as Sr, Ca, etc. as a base material and a rare earth element such as Ce, Eu, Pr, etc. as an emitting center by sputtering method, so that the electroluminescence emitting film can produce with high luminance and with various emission light colors. In the method, an element such as Sr to be sulfidized for a base material is used as a target. A sputtering gas such as Argon to be supplied to a sputtering apparatus is mixed with an H.sub.2 S gas as a base material sulfur compound. A rare earth element compound such as tris-cyclopentadienyl-cerium for an emitting center is gasified by a gas generator while being heated under supply of a carrier gas such as Ar, so that the gasified rare earth element compound is added to the sputtering gas. In the above-mentioned condition, an electroluminescence emitting film is produced on a display panel by a high frequency sputtering method in a sputtering atmosphere of the sputtering gas containing sulfur for the base material and a rare earth element for the emitting center.
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Kato Hisato
Kawashima Tomoyuki
Shibata Kazuyoshi
Taniguchi Harutaka
Breneman R. Bruce
Fuji Electric & Co., Ltd.
McDonald Rodney G.
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