Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent
1997-12-10
2000-11-14
Wilczewski, Mary
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
438163, H01L 21336, H01L 2184, H01L 218238
Patent
active
061469300
ABSTRACT:
An active-matrix liquid crystal display integrally formed with a driver circuit including: a pair of substrates disposed in opposing relation to each other; and a liquid crystal material sandwiched between the pair of substrates,
wherein the pair of substrates includes:
REFERENCES:
patent: 4743099 (1988-05-01), Noguchi
patent: 5040875 (1991-08-01), Dickerson et al.
patent: 5042918 (1991-08-01), Suzuki
patent: 5208476 (1993-05-01), Inoue
patent: 5317432 (1994-05-01), Ino
patent: 5323042 (1994-06-01), Matsumoto
patent: 5329140 (1994-07-01), Sera
patent: 5412493 (1995-05-01), Kunii et al.
patent: 5430320 (1995-07-01), Lee
patent: 5482870 (1996-01-01), Inoue
patent: 5485019 (1996-01-01), Yamazaki et al.
patent: 5488005 (1996-01-01), Han et al.
patent: 5508216 (1996-04-01), Inoue
patent: 5563427 (1996-10-01), Yudasaka et al.
patent: 5753556 (1998-05-01), Katada et al.
patent: 5770491 (1998-06-01), Mametani
patent: 5904511 (1999-05-01), Misawa et al.
Wolf, Silicon Processing for the VLSI Era, vol. 2-Process Integration, Sunset Beach: Lattice Press, 1990, pp. 298-311.
Kobayashi Kazuhiro
Masutani Yuichi
Murai Hiroyuki
Mitsubishi Denki & Kabushiki Kaisha
Wilczewski Mary
LandOfFree
Method of fabricating an active-matrix liquid crystal display does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of fabricating an active-matrix liquid crystal display, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating an active-matrix liquid crystal display will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2064228