Image analysis – Histogram processing – For setting a threshold
Patent
1991-02-07
1992-11-03
Boudreau, Leo H.
Image analysis
Histogram processing
For setting a threshold
356379, 364564, G06K 900, G01B 1128
Patent
active
051612011
ABSTRACT:
A pattern profile measuring method and apparatus for measuring the profile of a measuring portion of a pattern of a specimen placed on a specimen stage by controlling a deflector of a scanning electron microscope capable of setting a desired inclination angle of one of the specimen stage and an electron optical column, applying an electron beam to the measuring portion of the specimen, and image processing a secondary electron signal from the measuring portion. The method comprises: a first step of calculating the distance at the bottom portion of the measuring portion of the pattern by image processing the secondary electron signal when the electron beam is applied to the measuring portion at an inclination angle of zero; a second step of obtaining the number of pixels at a taper portion of the measuring portion of the pattern by image processing the secondary electron signal when the electron beam is applied to the measuring portion at a first predetermined inclination angle; a third step of obtaining the number of pixels at the taper portion by image processing the secondary electron signal when the electron beam is applied to the measuring portion at a second predetermined inclination angle different from the first inclination angle; a fourth step of calculating the taper angle and depth of the pattern in accordance with the numbers of pixels of the taper portion obtained at the second and third steps and the first and second predetermined inclination angles; and a fifth step of obtaining the profile of the taper portion in accordance with the strength change of the secondary electron signal from the taper portion.
REFERENCES:
patent: 4326252 (1982-04-01), Kohno et al.
patent: 4406545 (1983-09-01), Montone et al.
patent: 4767212 (1988-08-01), Kitahashi et al.
Hasegawa Isahiro
Hattori Kei
Kaga Yasuhiro
Komatsu Fumio
Boudreau Leo H.
Kabushiki Kaisha Toshiba
Kelley Christopher
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