Electron beam exposure apparatus with non-orthogonal electron em

Details Electron beam exposure apparatus with non-orthogonal electron em Electron beam exposure apparatus with non-orthogonal electron em

1996-11-05

2000-07-18

Shingleton, Michael B

Electric lamp and discharge devices: systems

Plural power supplies

Plural cathode and/or anode load device

315334, 313336, H01J 116, H01J 1910

Patent

active

060912022

ABSTRACT:
An electron beam exposure apparatus, comprising an electron emitting apparatus including an extracting electrode and a plurality of electron emitting elements having end portions exposed individually in a plurality of openings formed in rows and columns on a principal face of the extracting electrode, a control power supply for applying a voltage between the extracting electrode and selected ones of the electron emitting elements to emit electrons from the selected electron emitting elements, an acceleration electrode in the form of a flat plate having a number of very small openings equal to the number of and corresponding to the electron emitting elements, and a converging electrode in the form of a flat plate having a number of very small openings equal to the number of and corresponding to the electron emitting elements.

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T. Chang et al., "Arrayed miniature electron beam columns for high throughput sub-100 nm lithography", J. Vac. Sci. Technol., Nov.-Dec. 1992, vol. 10, No. 6, pp. 2743-2748.

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