Sheet plasma sputtering method and an apparatus for carrying out

Details Sheet plasma sputtering method and an apparatus for carrying out Sheet plasma sputtering method and an apparatus for carrying out

1988-09-09

1989-12-05

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 204298, C23C 1434, C23C 1446

Patent

active

048850683

ABSTRACT:
A high-efficient sheet plasma sputtering method and an apparatus for carrying out the method which comprise means for deforming an arc plasma stream into a form of sheet by a magnetic field so that ions in the sheet plasma are accelerated to a target which is controlled to have a negative potential to the sheet plasma, whereby a coating layer is formed by sputtering on a substrate arranged opposite the target with respect to the sheet plasma.

REFERENCES:
patent: 3472751 (1969-10-01), King
patent: 3839182 (1974-10-01), Sager
patent: 4424103 (1984-01-01), Cole
patent: 4767931 (1988-08-01), Sato et al.

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