Air intake apparatus of chemical vapor deposition equipment and

Details Air intake apparatus of chemical vapor deposition equipment and Air intake apparatus of chemical vapor deposition equipment and

1998-09-29

2000-07-18

Simmons, David A.

Gas separation: processes

Filtering

Coated or chemically treated filter

55471, 55473, 55486, 553852, 95287, B01D 2956, B01D 3916

Patent

active

060901888

ABSTRACT:
An air intake apparatus for semiconductor fabricating equipment reduces the inflow of chemical contaminants, such as ozone (O.sub.3), into the equipment. The air intake apparatus includes a fan as an air intake device, and a chemical filter containing activated carbon to remove the chemical contaminants from air drawn in from outside the equipment. The air intake apparatus may further include first and second filters for removing particulate contaminants from the air. By applying the air intake apparatus to chemical vapor deposition (CVD) equipment used to carry out a process for forming hemispherical grains (HSGs), which is sensitive to a native oxide layer, the ozone density inside the CVD equipment is decreased. Accordingly, the semiconductor device produced has a higher capacitance and enhanced performance.

REFERENCES:
patent: 3577710 (1971-05-01), Feldman
patent: 5039321 (1991-08-01), Satoh et al.
patent: 5626820 (1997-05-01), Kinkead et al.
patent: 5681364 (1997-10-01), Fortune
patent: 5752985 (1998-05-01), Nagafune et al.
patent: 5772738 (1998-06-01), Muraoka
patent: 5827339 (1998-10-01), Nagafune et al.

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