Wafer tray construction

Heating – Accessory means for holding – shielding or supporting work...

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Details

373 18, 432258, F27D 500

Patent

active

044190760

ABSTRACT:
Wafer tray construction for use in a gas plasma reactor. A plurality of the trays are arranged in an array, with an overlap at the adjacent edges of the trays to prevent line-of-sight communication between the trays and ion bombardment of the support on which the trays are mounted. In one disclosed embodiment, the edges of the trays are configured to form the overlap, and in a second embodiment bars inserted between the trays cooperate with the edge portions to form the overlap.

REFERENCES:
patent: 1029709 (1912-06-01), Norrlander
patent: 2297286 (1942-09-01), Book
patent: 3475070 (1969-10-01), Hoshall

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