Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1982-03-29
1983-12-06
Lusignan, Michael R.
Coating apparatus
Gas or vapor deposition
Chamber seal
118 50, C23C 1308
Patent
active
044186460
ABSTRACT:
A valve (16) for use in a vacuum load lock for semiconductor processing equipment. The valve includes a base having a horizontal passage (34) formed through it for the transfer of semiconductor wafers (12) and a vertically moving valve element (50) received in a second passage (36) intersecting the first. The valve element includes a sealing element (62) which seals partly on a horizontal wall of the first passage and partly on a wall of the second passage, and is actuated by an air piston (56). A seal is effected between the pressurized and evacuated areas of the valve by means of a flexible diaphragm attached to the piston rod (48) and to the valve body (20, 22).
REFERENCES:
patent: 3521765 (1970-07-01), Kauffman et al.
patent: 4184448 (1980-01-01), Aichert et al.
patent: 4278380 (1981-07-01), Guarino
patent: 4338883 (1982-07-01), Mahler
Eaton Corporation
Grace C. H.
Lusignan Michael R.
Sajovec F. M.
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