Load lock valve

Coating apparatus – Gas or vapor deposition – Chamber seal

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Details

118 50, C23C 1308

Patent

active

044186460

ABSTRACT:
A valve (16) for use in a vacuum load lock for semiconductor processing equipment. The valve includes a base having a horizontal passage (34) formed through it for the transfer of semiconductor wafers (12) and a vertically moving valve element (50) received in a second passage (36) intersecting the first. The valve element includes a sealing element (62) which seals partly on a horizontal wall of the first passage and partly on a wall of the second passage, and is actuated by an air piston (56). A seal is effected between the pressurized and evacuated areas of the valve by means of a flexible diaphragm attached to the piston rod (48) and to the valve body (20, 22).

REFERENCES:
patent: 3521765 (1970-07-01), Kauffman et al.
patent: 4184448 (1980-01-01), Aichert et al.
patent: 4278380 (1981-07-01), Guarino
patent: 4338883 (1982-07-01), Mahler

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