Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1998-07-30
2000-08-15
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257368, 257617, H01L 2976, H01L 2994, H01L 31062, H01L 31113, H01L 21119
Patent
active
061040568
ABSTRACT:
A field-effect semiconductor element implemented with a reduced number of elements and a reduced area and capable of storing data by itself without need for cooling at a cryogenic temperature, and a memory device employing the same. Gate-channel capacitance is set so small that whether or not a trap captures one electron or hole can definitely and distinctively be detected in terms of changes of a current of the semiconductor FET element. By detecting a change in a threshold voltage of the semiconductor element brought about by trapping of electron or hole in the trap, data storage can be realized at a room temperature. In accordance with one embodiment, a carrier confinement region, isolated from a channel and a gate of the semiconductor FET element, is provided to operate as a storage node for trapping the carrier or carriers.
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Aoki Masakazu
Hashimoto Takashi
Ishii Tomoyuki
Nakagome Yoshinobu
Sakata Takeshi
Hitachi , Ltd.
Hitachi Device Engineering & Co., Ltd.
Ngo Ngan V.
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