Photoresist compositions and method

Details Photoresist compositions and method Photoresist compositions and method

1983-09-14

1985-08-27

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430911, 430909, 430914, 430916, 430921, 430925, 20415915, 20415918, 20415924, 20415923, G03C 170

Patent

active

045378541

ABSTRACT:
Water soluble blends are provided of alkanolacrylamide, water soluble hydroxyl containing film forming organic oligomer and an effective amount of an onium salt photoinitiator. These photocurable compositions can be used as photoresists.

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