Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-10-11
1996-11-26
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257369, 257401, H01L 2701, H01L 2712, H01L 310392, H01L 2976
Patent
active
055788530
ABSTRACT:
A semiconductor memory cell, or a semiconductor memory cell for ASICs, of the structure is provided which ensures stable transistor operation, which does not require a large-capacitance capacitor as required in conventional DRAMs, which ensures reliable reading and writing of information, that permits short-channel design, and that allows the cell area to be reduced. The semiconductor memory cell includes: an information storage transistor TR.sub.1 comprising a semiconductor channel layer Ch.sub.1, first and second conductive gates G.sub.1, G.sub.2, and first and second conductive layers L.sub.1, L.sub.2 ; and a switching transistor TR.sub.2 comprising a semiconductor channel forming region Ch.sub.2, a third conductive gate G.sub.3, and third and fourth conductive layers L.sub.3, L.sub.4, wherein the fourth conductive layer L.sub.4 is connected to the second conductive gate G.sub.2, the first conductive gate G.sub.1 and the third conductive gate G.sub.3 are connected to a first memory-cell-selection line, the first conductive layer L.sub.1 and the third conductive layer L.sub.3 are connected to a second memory-cell-selection line, the second conductive layer L.sub.2 is connected to a fixed potential, and the semiconductor channel forming region Ch.sub.2 is connected to a read/write selection line.
REFERENCES:
patent: 4330849 (1982-05-01), Tagei et al.
patent: 4384300 (1983-05-01), Iizuka
patent: 5128731 (1992-07-01), Lien et al.
patent: 5283457 (1994-02-01), Matloubian
Hayashi Yutaka
Matsushita Takeshi
Ngo Ngan V.
Sony Corporation
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