Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1992-04-20
1994-05-24
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430326, 430920, 430921, 522 50, G03F 7004, G03F 7039
Patent
active
053147863
ABSTRACT:
A 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine esterified with two or three arylsulfonic acids or heteroarylsulfonic acids is useful to prepare a positive-working radiation-sensitive mixture which is distinguished by a high resolution and a high sensitivity over a wide spectral range. It also shows high thermal stability and does not form corrosive photolysis products on exposure. A radiation-sensitive recording material which is produced from these esters is suitable for producing photoresists, electronic components, printing plates or for chemical milling.
REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 4758497 (1988-07-01), Shah et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
patent: 5118582 (1992-06-01), Ueno et al.
patent: 5187045 (1993-02-01), Bonham et al.
Tabata et al, "Polymers for Microelectronics-Science and Technology", 1989, pp. 66-67.
Houlihan et al., SPIE, Advances in Resist Technology and Processing, vol. 920, 1988.
Willson, "Organic Resist Materials--Theory, Materials and Processing", Series 219, 1983.
Fuchs Juergen
Pawlowski Georg
Roeschert Horst
Ashton Rosemary
Hoechst Aktiengesellschaft
McCamish Marion E.
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