Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Patent
1991-08-29
1994-05-24
Schwadron, Martin P.
Drying and gas or vapor contact with solids
Process
Gas or vapor pressure is subatmospheric
34 92, 134902, 414225, B08B 300, C23C 1600
Patent
active
053145097
ABSTRACT:
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
REFERENCES:
patent: 4924890 (1990-05-01), Giles et al.
patent: 4936329 (1990-06-01), Michael et al.
patent: 5014217 (1991-05-01), Savage
Itou Atsushi
Kato Shigekazu
Nishihata Kouji
Tsubone Tsunehiko
Hitachi , Ltd.
Lee Kevin L.
Schwadron Martin P.
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